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Volumn 73, Issue 6, 1998, Pages 838-840

Strain and defect microstructure in ion-irradiated GeSi/Si strained layers as a function of annealing temperature

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EID: 0004691555     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122018     Document Type: Article
Times cited : (10)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.