Critical area based yield prediction using in-line defect classification information [DRAMs]

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn 2000-January, Issue , 2000, Pages 83-88

  Segal, J ^a   Sagatelian, A ^a   Hodgkins, B ^a   Chu, Ben ^b   Singh, T ^b   Berman, H ^b  

^a HPL Technologies Inc   (United States)

^b Dominion Semiconductor   (United States)

Author keywords

Area measurement; Data analysis; Databases; Failure analysis; Information analysis; Optical detectors; Optical filters; Optical losses; Optical noise; Semiconductor device noise

Indexed keywords

DATA REDUCTION; DATABASE SYSTEMS; DEFECTS; FAILURE ANALYSIS; INFORMATION ANALYSIS; MANUFACTURE; OPTICAL FILTERS; OPTICAL LOSSES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES;

AREA MEASUREMENT; CRITICAL AREA ANALYSIS; LINE DEFECTS; OPTICAL DETECTORS; OPTICAL NOISE; SEMICONDUCTOR DEVICE NOISE; YIELD MODELING; YIELD PREDICTION;

CLASSIFICATION (OF INFORMATION);

EID: 0003742282     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2000.902563     Document Type: Conference Paper

References (7)

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