Optical emission spectroscopy during the bias-enhanced nucleation of diamond microcrystals by microwave plasma chemical vapor deposition process

Journal of Materials Research

Volumn 11, Issue 11, 1996, Pages 2852-2860

  Barshilia, H C ^a   Mehta, B R ^a   Vankar, V D ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; DENSITY MEASUREMENT (SPECIFIC GRAVITY); EMISSION SPECTROSCOPY; FILM GROWTH; METHANE; NUCLEATION; PLASMA APPLICATIONS; SILICON; THIN FILMS;

BIAS ENHANCED NUCLEATION (BEN); MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MWPCVD); OPTICAL EMISSION SPECTROSCOPY (OES);

DIAMONDS;

EID: 0030284482     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0360     Document Type: Article

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