Use of sputtering and negative carbon ion sources to prepare carbon nitride films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 1179-1184

  Murzin, Ivan H ^a   Tompa, Gary S ^a   Forsythe, Eric W ^a   Wei, Jianjun ^b   Muratov, Victor ^b   Fischer, Traugott ^b  

^a STRUCTURED MATERIALS INDUSTRIES INC   (United States)

^b STEVENS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON IONS; CARBON NITRIDE FILMS; CORROSION-RESISTANT COATING; FRICTION COEFFICIENTS; GROWING FILMS; LOW ENERGIES; MAGNETRON SPUTTERED FILMS; NITROGEN ATMOSPHERES; NITROGEN ION BEAM; NITROGEN IONS; STRETCHING MODES; TRIBOLOGICAL PROPERTIES; WEAR RATES;

CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; FRICTION; ION BEAMS; ION SOURCES; IONS; MAGNETRONS; NITROGEN; OPTICAL COATINGS; RAMAN SPECTROSCOPY;

CARBON FILMS;

EID: 0003159258     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580451     Document Type: Article

References (31)

1. A. Y. Liu and M. Cohen, Phys. Rev. B 41, 10 727 (1990).
2. D. Marton, K. J. Boyd, and J. W. Rabalais, Int. J. Mod. Phys. B 9, 3527 (1995).
3. P. Hammer, M. A. Baker, C. Lenardi, and W. Gissler, Proceedings of the International Conference on Metallurgical Thin Films, San Diego, 1996 (in press).
4. P. Riviere, D. Texier, J. Delafond, M. Jaouen, E. L. Mathe, and J. Chaumont, Mater. Lett. 22, 115 (1995).
5. A. R. Merchant, D. R. McCulloch, McKenzie, Y. Yin, L. Hall, and E. G. Gerstner, J. Appl. Phys. 79, 6914 (1996);
6. see also, D.G. McCulloch and A. R. Merchant, International Conference on Metallurgical Thin Films (1996) (in press).
7. H. Han, He-Xiang, and B. J. Feldman, Solid State Commun. 65, 921 (1988);
8. see also, Y. S. Gu et al., International Conference on Metallurgical Thin Films (1996) (in press).
9. A. Khurshadov, K. Kato, and S. Daisuke, J. Vac. Sci. Technol. A 14, 2935 (1996).
10. E. J. Chi, J. Y. Shim, and H. K. Baik, 43rd American Vacuum Society Symposium, Philadelphia, PA, FP-TuA5, Abstracts, p. 79 (1996).
11. E. P. Donovan, D. R. Brighton, G. K. Hubler, and D. van Vechten, Nucl. Instrum. Methods B 19/20, 983 (1987).
12. U. Yuji and Y. Keiichi, J. Vac. Sci. Technol. B 10, 67 (1992).
13. G. S. Tompa, I. H. Murzin, S. I. Kim, Y. O. Ahn, B. Gallois, T. E. Fischer, and E. W. Forsythe, Mater. Res. Soc. Symp. Proc. 396, 545 (1996);
14. for modeling Raman spectra see B. Dorfman, M. Abraizov, P. Pypkin, M. Strongin, X.-Q. Yang, D. Yan, F. H. Pollak, J. Grow, and R. Levy, Mater. Res. Soc. Symp. Proc. 349, 547 (1994).
15. Y. Park, Y. W. Ko, M. H. Sohn, and S. I. Kim, Mater. Res. Soc. Symp. Proc. 396, 623 (1996).
16. K. Kreider, M. J. Tarlov, G. J. Gillen, G. E. Poirier, L. H. Ives, W. D. Bowers, R. B. Marinenko, and D. T. Smith, J. Mater. Res. 10, (1995).
17. D. Li, S. Lopez, Y. W. Chung, M.-S. Wong, and W. D. Sproul, J. Vac. Sci. Technol. A 13, 1063 (1995).
18. D. Li, Y. W. Chung, S. Yang, M.-S. Wong, F. A. Adibi, and W. D. Sproul, J. Vac. Sci. Technol. A 12, 1470 (1995).
19. S. Kumar, and T. L. Tansley, Thin Solid Films 256, 44 (1995).
20. J. F. Kaufman, S. Metin, and D. D. Saperstein, Phys. Rev. B 39, 13 053 (1989).
21. W. T. Zheng, H. Sjostrom, I. Ivanov, K. Z. Xing, E. Broitman, W. R. Salaneck, J. E. Greene, and J.-E. Sundgren, J. Vac. Sci. Technol. A 14, 2696 (1996).
22. M. R. Wixom, J. Am. Chem. Soc. 73, 1686 (1990).
23. F. Tuinstra and J. L. Koenig, J. Chem. Phys. 53, 1126 (1970).
24. E. H. Lee, D. M. Hembree, Jr., G. R. Gao, and L. K. Mansur, Phys. Rev. B 48, 15 540 (1993).
25. D. Beeman, J. Silverman, R. Lynds, and M. R. Anderson, Phys. Rev. B 30, 870 (1984).
26. E. C. Cutiongco, D. Li, Y.-W. Chung, and C. S. Bhatia, J. Tribology 118, 543 (1996).
27. K. Ogata, J. Chubaci, and F. Fujimoto, J. Appl. Phys. 76, 3791 (1994).
28. M. Cheng, X. Lin, V. P. Dravid, Y. W. Chung, M. S. Wong, and W. D. Sproul, Tribol. Trans. 36, 491 (1993).
29. M. Cheng, X. Lin, V. P. Dravid, Y. W. Chung, M. S. Wong, and W. D. Sproul, Surf. Coat. Technol. 54/55, 360 (1992).
30. H. Sjostrom, L. Hultman, J.-E. Sundgrcn, S. V. Hainsworth, T. F. Page, and G. S. A. M. Theunissen, J. Vac. Sci. Technol. A 14, 56 (1996).
31. D. Li, X. Chu, S.-C. Cheng, X.-Wei Lin, V. Dravid, Y. W. Chung, M. S. Wong, and W. D. Sproul, Appl. Phys. Lett. 67, 203 (1995).