Formation of silicon on insulator using separation by implantation of oxygen with water plasma

Applied Physics Letters

Volumn 78, Issue 1, 2001, Pages 73-75

  Chen, Jing ^a   Wang, Xi ^a,b   Chen, Meng ^a   Zheng, Zhihong ^a   Yu, Yuehui ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b NONE   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003096963     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1337642     Document Type: Article

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