Three-Dimensional Micropatterns of Well-Aligned Carbon Nanotubes Produced by Photolithography

Journal of Nanoscience and Nanotechnology

Volumn 1, Issue 1, 2001, Pages 43-47

  Chen, Qidao ^a,b   Dai, Liming ^a  

^a CSIRO   (Australia)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

Carbon nanotubes; Photolithography; Photoresist; Three dimensional micropatterns

Indexed keywords

CARBON NANOTUBE; INDOLE DERIVATIVE; IRON; PHTHALOCYANINE; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; HEAT; ISOLATION AND PURIFICATION; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PHOTOGRAPHY; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY;

CRYSTALLIZATION; HEAT; INDOLES; IRON; MATERIALS TESTING; MICROSCOPY, ELECTRON, SCANNING; MOLECULAR CONFORMATION; NANOTECHNOLOGY; NANOTUBES, CARBON; PHOTOGRAPHY; QUALITY CONTROL; QUARTZ; SILICON DIOXIDE;

EID: 0003086932     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2001.003     Document Type: Article

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