Formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by MOCVD -precursor versus substrate control

Inorganica Chimica Acta

Volumn 291, Issue 1-2, 1999, Pages 380-387

  Zybill, Christian Erich ^a   Huang, Wei ^b  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Deposition mechanism; DFT; Iron silicides; MOCVD; UPS

Indexed keywords

ACTIVATION ENERGY; BOND STRENGTH (CHEMICAL); CHLORINE COMPOUNDS; DENSITY FUNCTIONAL THEORY; IRON; IRON COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REACTION INTERMEDIATES; SILICIDES; SUBSTRATES; TEXTURES; VAPOR DEPOSITION;

ADSORBED INTERMEDIATES; BOND DISSOCIATION ENERGIES; DECOMPOSITION KINETICS; DEPOSITION MECHANISM; ENERGY OF ACTIVATION; IRON SILICIDES; POROUS AGGREGATES; SILYLENE COMPLEXES;

SILICON;

EID: 0002460042     PISSN: 00201693     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0020-1693(99)00158-9     Document Type: Article

References (44)

1. (a) J. Derrien, J. Chevrier, V. Le Tranh, J.E. Mahan, Appl. Surf. Sci. 56-58 (1992) 382.
2. (b) M.C. Bost, J.E. Mahan, J. Appl. Phys. 58 (1985) 2696.
3. (c) H. Chen, P. Han, X.D. Huang, Y.D. Zheng, J. Vac. Sci. Technol. A 14 (1996) 905.
4. (a) M. Eizenberg, K.N. Tu, J. Appl. Phys. 53 (1982) 6885.
5. (b) B. Egert, G. Panzer, Phys. Rev. B 29 (1984) 2091.
6. K. Maex, M. van Rossum, Properties of Metal Silicides, INSPEC IEE, London (1995).
7. Birkholz U., Schelm J. Phys. Status Solidi. 27:1968;413.
8. (a) H.G. Ang, L. Luo, C.E. Zybill, S.F. Lim, D.H.C. Chua, J. Lin, A.T.S. Wee, K.L. Tan, Thin Solid Films 325 (1998) 87.
9. (b) Y. Dusausoy, J. Protas, R. Wandji, B. Roques, Acta Crystallogr. Sect. B 27 (1971) 1209.
10. Maury F., Brandt L., Kaesz H.D. J. Organomet. Chem. 449:1993;159.
11. L. Luo, MSc Thesis, National University of Singapore, 1997.
12. B.J. Aylett, H.M. Colquhoun, J. Chem. Soc., Dalton Trans. (1977) 2058.
13. Stauf G.T., Dowben P.A., Boag N.M., Morales de la Garza L., Dowben S.L. Thin Solid Films. 156:1988;327.
14. Luo L., Zybill C.E., Ang H.G., Lim S.F., Chua D.H.C., Lin J., Wee A.T.S., Tan K.L. Thin Solid Films. 325:1998;87.
15. Mahan J.E., Geib K.M., Robinson G.Y., Long R.G., Xinghua Y., Bai G., Nicolet M.A., Nathan M. Appl. Phys. Lett. 56:1990;2126.
16. (a) J.M. Gallego, R. Miranda, J. Appl. Phys. 69 (1991) 1377.
17. (b) J. Alvarez, J.J. Hinarejos, E.G. Michel, J.M. Gallego, A.L. Vázquez de Parga, J. de la Figuera, C. Ocal, R. Miranda, Appl. Phys. Lett. 59 (1991) 99.
18. (c) S. Kennou, N. Cherief, R.R. Cinti, T.A. Nguyen Tan, J.Y. Veuillen, Surf. Sci. 211/212 (1989) 685.
19. (a) I. Novak, W. Huang, L. Luo, H.H. Huang, H.G. Ang, C.E. Zybill, Organometallics 16 (1997) 1567.
20. (b) W. Huang, C.E. Zybill, L. Luo, W. Hieringer, H.H. Huang, Organometallics 17 (1998) 5825.
21. (c) C.E. Zybill, R. Schmid, I. Novak, W. Huang, L. Luo, J. Lin, H.G. Ang, H.H. Huang, 214th ACS National Meeting, Las Vegas, Sep. 7-11, 1997, INOR 428.
22. (d) K. Hübler, P.A. Hunt, S.M. Maddock, C.E.F. Rickard, W.R. Roper, D.M. Salter, P. Schwerdtfeger, L.J. Wright, Organometallics 16 (1997) 5076.
23. C.E. Zybill, 32nd ACS Organosilicon Symposium, Milwaukee, WI, 1999.
24. (a) P.J. Bassett, D.R. Lloyd, J. Chem. Soc. (A) (1971) 641.
25. (b) D.C. Frost, F.G. Herring, A. Katrib, R.A.N. McLean, J.E. Drake, N.P.C. Westwood, Chem. Phys. Lett. 10 (1971) 347.
26. Demuth R. Z. Naturforsch., Teil. B. 32:1977;1252.
27. (a) C. Zybill, H. Handwerker, H. Friedrich, Adv. Organomet. Chem. 36 (1994) 229.
28. (b) T.D. Tilley, in: S. Patai, Z. Rappoport (Eds.), The Silicon-Heteroatom Bond, Wiley, Chichester, 1992.
29. (c) T.D. Tilley, in: S. Patai, Z. Rappoport (Eds.), The Chemistry of Organic Silicon Compounds, Wiley, Chichester, 1989.
30. (d) C. Zybill, C. Liu, Synlett 7 (1995) 687.
31. (e) C. Zybill, Top. Curr. Chem. 160 (1992) 1.
32. Jetz W., Graham W.A.G. J. Am. Chem. Soc. 89:1967;2773.
33. Spalding T.R. J. Organomet. Chem. 149:1978;371.
34. (a) A. Márquez, J.F. Sanz, J. Am. Chem. Soc. 114 (1992) 2903.
35. (b) T.R. Cundari, M.S. Gordon, Organometallics 11 (1992) 3122.
36. (a) A.R. Rossi, R. Hoffmann, Inorg. Chem. 14 (1975) 365.
37. (b) M. Elian, R. Hoffmann, Inorg. Chem. 14 (1975) 1058.
38. Leis C., Wilkinson D.L., Handwerker H., Zybill C., Müller G. Organometallics. 11:1992;514.
39. (a) T. Ziegler, Can. J. Chem. 73 (1995) 743.
40. (b) T. Ziegler, Chem. Rev. 91 (1991) 651.
41. (c) R.G. Parr, W. Yang, Density Functional Theory of Atoms and Molecules, Oxford University Press, New York, 1989.
42. (d) E.S. Kryachko, E.V. Ludena, Density Functional Theory of Many-electron Systems, Kluwer, Dordrecht, 1991.
43. (a) A.D. Becke, J. Chem. Phys. 98 (1993) 1372.
44. (b) C. Lee, W. Yang, R.G. Parr, Phys. Rev. B 87 (1988) 785.