In situ UPS study of the formation of FeSi films from cis-Fe(SiCl 3)2(CO)4

Organometallics

Volumn 17, Issue 26, 1998, Pages 5825-5829

  Huang, Wei ^a   Zybill, Christian Erich ^b   Luo, Lan ^a   Hieringer, Wolfgang ^b   Huang, Hsing Hua ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000372396     PISSN: 02767333     EISSN: None     Source Type: Journal    
DOI: 10.1021/om980550u     Document Type: Article

References (43)

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