Structural characterization of oxidized allotaxially grown CoSi2 layers by x-ray scattering

Journal of Applied Physics

Volumn 87, Issue 1, 2000, Pages 133-139

  Kaendler, I D ^a,b   Seeck, O H ^b   Schlomka, J P ^a   Tolan, M ^a   Press, W ^a   Stettner, J ^a   Kappius, L ^c   Dieker, C ^a,c   Mantl, S ^c  

^a UNIVERSITY OF KIEL   (Germany)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001744474     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371834     Document Type: Article

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