Investigation of tungsten incorporated amorphous carbon film

Thin Solid Films

Volumn 355, Issue , 1999, Pages 174-178

  Rusli, ^a   Yoon, S F ^a   Yang, H ^a   Ahn, J ^a   Huang, Q F ^a   Zhang, Q ^a   Guo, Y P ^b   Yang, C Y ^b   Teo, E J ^b   Wee, A T S ^b   Huan, A C H ^b  

^a Sch Elec Electron Eng   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON CYCLOTRON RESONANCE; HARDNESS; IONIZATION; LIGHT ABSORPTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TUNGSTEN; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION (ECR-CVD);

AMORPHOUS FILMS;

EID: 0033355166     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00511-8     Document Type: Article

References (11)

1. Robertson J. Prog. Solid State Chem. 21:1991;199.
2. Dimigen H., Hubsch H., Memming R. Appl. Phys. Lett. 50:1987;1056.
3. Klages C.P., Memming R. Material Science Forum 52 and. 53:1989;609.
4. Yoon S.F. Rusli, J. Ahn, Q. Zhang, Y.S. Wu, H. Yang, J. Vac. Sci. Technol. A. 17:1999;121.
5. Rusli J., Yoon S.F., Yang H., Ahn J., Zhang Q., New W.L. J. Appl. Phys. 84:1998;5277.
6. Koeberle H., Grischke M., Thieme F., Benndorf C., Memming R. Surf. Coat. Technol. 39/40:1989;275.
7. Laurent C., Kay E. J. Appl. Phys. 65:1989;1717.
8. Salvati L. Jr., Makovsky L.E., Stencel J.M., Brown F.R., Hercules D.M. J. Phys. Chem. 85:1981;3700.
9. Nefedov V.I., Firsov M.N., Shaplygin I.S. J. Electron. Spect. Related Phenom. 26:1982;65.
10. Sherwood P.M.A. Briggs D., Seah M.P. Practical surface analysis by Auger and X-ray Photoelectron Spectroscopy. 1983;445 Wiley, New York.
11. Harnack J.T., Thieme F., Benndorf C. Surf. Coat. Technol. 39/40:1989;285.