Effects of airborne molecular contamination on DUV photoresists

Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 425-444

  Dean, Kim R ^a   Miller, Daniel A ^a   Carpio, Ronald A ^a   Petersen, John S ^a   Rich, Georgia K ^a  

^a SEMATECH   (United States)

Author keywords

Airborne contamination; Delay stability; DUV resists; FTIR

Indexed keywords

EID: 0001290957     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.425     Document Type: Article

References (18)

1. W.D. Hinsberg and S.A. MacDonald, "Quantitation of Airborne Chemical Contamination of Chemically Amplified Resists using Radiochemical Analysis" SPIE, Advances in Resist Technology and Processing IX, vol. 1672 (1992) 24.
2. Y. Kawai et al., "The Effects of an Organic Base in a Chemically Amplified Resist on Pattering Characteristics Using KrF Lithography," Digest of Papers, MicroProcess '94, The 7th MicroProcess Conference (1994) 202.
3. J. Vigil, M. Barrick, T. Grafe, "Contamination Control For Processing DUV Chemically Amplified Photoresists," SPIE, Advances in Resist Technology and Processing XII, vol. 2438 (1995) 626.
4. K.R. Dean and Ronald A. Carpio, "Real-Time Detection of Airborne Contaminants in DUV Lithographic Processing Environments," Institute of Environmental Sciences, (1995) 9.
5. K.R. Dean and R.A. Carpio, "Contamination of Positive Deep-UV Photoresists," OCG Interface '94 Proceedings (1994) 199.
6. H. Ito, "Deep-UV Resists: Evolution and Status," Solid State Technology, July (1996) 164.
7. S. Funato, N. Kawasaki, Y.Kinoshita, S. Masuda, H. Okazaki, M.Padmanaban, T.Yamamoto, and G. Pawlowski, "Application of Photodecomposable Base Concept to Two-Component Deep-UV Chemically Amplified Resists," SPIE, Advances in Resist Technology and Processing XIII, vol. 2724 (1996) 186.
8. T. Tababe, Y. Kobayashi and A. Tsuji, "FED Stabilized Chemically Amplified Photoresist," SPIE, Advances in Resist Technology and Processing IX, vol. 2724 (1996) 61.
9. F.T. Lee, D. R. Wanlass, and B. Walsh, "Thin Film Pitting: Is NMP the Culprit?" Semiconductor International, June (1994) 175.
10. H. Ito, "The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists," ACS Symposium, Microelectronics Technology, series 614 (1995) 21.
11. W. Conley, Greg Breyta, B. Brunsvold, R. DePietro, D. Hofer, S. Holmes, H. Ito, R. Nunes, G. Fichtl, P. Hagerty, and J. Thackeray, "The Lithographic Performance of an Environmentally stable Chemically Amplified Photoresist (ESCAP)," SPIE, Advances in Resist Technology and Processing IX, vol. 2724 (1996) 34.
12. J.S. Petersen, C.A. Mack, J. Sturtevant, J.D. Byers and D.A. Miller, "Non-constant Diffusion Coefficients: Short Description of Modeling and Comparison to Experimental Results," , SPIE, Advances in Resist Technology and Processing XII, vol. 2738 (1995) 167.
13. J.S. Petersen and J.S. Byers, "Examination of Isolated and grouped feature Bias in Positive Acting, Chemically Amplified Resist Systems," SPIE SPIE Advances in Resist Technology and Processing XI, vol. 2724 (1996) 163.
14. C. J. Gamsky, P. M. Dentinger, G. R. Howes, and J. W. Taylor, "Quantitative Analysis of Chemically Amplified Negative Photoresist Using Mirror-Backed Infrared Reflection Absorption Spectroscopy", SPIE Advances in Resist Technology and Processing XII, 2438, (1995) 143.
15. S. Nour, E. Pavelcheck, T. Linsey, M. Moynihan, L. Gambin, "Process Techniques for Improving Post Exposure Delay Stability in Chemically Amplified Resists," SPIE Advances in Resist Technology and Processing XIV, vol. 3049, to be published, 1997.
16. K.R. Dean, D.A. Miller, R.A. Carpio, and John Petersen, "Airborne Contamination of DUV Photoresists: Determining the New Limits of Processing Capability," Olin Interface '97 Proceedings (1996) 109.
17. U. Kumar, A. Pandya, R. Sinta, W.Huang, R. Bantu, and A. Katnani, "Probing the Environmental Stability and Bake Latitudes of Acetal/Ketal Protected Polyvinylphenol DUV Resist Systems," SPIE Advances in Resist Technology and Processing XIV, vol. 3049, to be published, (1997).
18. K.I. Schenau, M. Reuhman and S. Slonaker, "Investigation of DUV Process Variables Impacting Sub-Quarter Micron Imaging," Olin Interface '96 Proceedings (1996), 63.