Spin dependent tunnel/spin-valve devices with different pinning structures made by photolithography

Journal of Applied Physics

Volumn 85, Issue 8 II A, 1999, Pages 5255-5257

  Wang, D ^a   Tondra, M ^a   Daughton, J M ^a   Nordman, C ^a   Pohm, A V ^a  

^a NVE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001213740     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369958     Document Type: Article

References (11)

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