Inhibition and promotion efficiency of bis-phenol type dissolution inhibitors during development

Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 417-424

  Kihara, Naoko ^a   Saito, Satoshi ^a   Naito, Takuya ^a   Ushirogouchi, Tohru ^a   Asakawa, Koji ^a   Nakase, Makoto ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Cresolphthalein; Dissolution inhibitor; Resist; t Boc

Indexed keywords

EID: 17144415424     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.417     Document Type: Article

References (8)

1. T. Hattori, T. Ueno, H. Shiraishi, N. Hayashi, T. Iwayanagi, JJAP Series 5, Proc. of 1991 Intern. MicroProcess Conference, 168.
2. M. K. Templeton, C. R. Szunada, A. Zampini, Proc. of SPIE, 771 (1987) 136.
3. H. Ban, J. Nakamura, K. Deguchi, and A. Tanaka, J. Vac. Sci. Technol. B9(6) (1991) 3387.
4. R. A. Arcus, Proc. of SPIE, 631 (1986) 124.
5. T. Aoai, T. Yamada, T. Kokubo, Proc. of SPIE, 2195(1994) 111.
6. N. Kihara, S. Saito, T. Naito, T. Ushirogouchi, K. Asakawa, M. Nakase, Proc. of SPIE, 2724 (1996) 208.
7. N. Kihara, T. Ushirogouchi, T. Tada, T. Naito, S. Saito, M. Nakase, J. Electrochem. Soc., 141 (1994) 3162.
8. F. M. Houlihan, F. Boucard, J. M. J. Fréchet, and C. G. Willson, Can. J. Chem., 63 (1985) 153.