Synthesis of silicon-containing photoresists for ArF excimer laser lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6869-6872

  Kim, Young Dae ^a   Park, Sang Jin ^a   Lee, Haiwon ^a   Kim, Eung Ryul ^a   Choi, Sang Jun ^a   Lee, Si Hyeung ^b  

^a Hanyang University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

ArF lithography; Bilayer resist; Photoresist; Protecting group

Indexed keywords

EID: 0001185305     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6869     Document Type: Article

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