SCOPUS 정보 검색 플랫폼

Volumn 69, Issue 4, 1996, Pages 529-531

New features of the layer-by-layer deposition of microcrystalline silicon films revealed by spectroscopic ellipsometry and high resolution transmission electron microscopy

(5) Cabarrocas, P Roca I a Hamma, S a Hadjadj, A a Bertomeu, J b Andreu, J b

a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

b UNIVERSITY OF BARCELONA (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; DEPOSITION; ELECTRON MICROSCOPY; ELLIPSOMETRY; METALLIC FILMS; MICROCRYSTALLINE SILICON; OPTICAL MULTILAYERS; POROUS SILICON; SILICON; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES;

HIGH RESOLUTION; LARGE CRYSTAL; LAYER BY LAYER DEPOSITION; MICROCRYSTALLINE FILMS; MICROCRYSTALLINE SILICON FILMS; MULTILAYER MODELS; OPTICAL MODELS; SEQUENTIAL PROCESS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 84974844165 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.117776 Document Type: Article

Times cited : (41)

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