Characterization of poly-Si thin films deposited by magnetron sputtering onto Ni prelayers

Journal of Applied Physics

Volumn 87, Issue 7, 2000, Pages 3532-3536

  Guliants, E ^a   Anderson, W A ^a  

^a 212 Bonner Hall ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001108199     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372377     Document Type: Article

References (14)

1. W. A. Anderson, B. Jagannathan, and E. Klementieva-Guliants, Prog. Photovoltaics 5, 433 (1997).
2. R. L. Wallace and W. A. Anderson, Mater. Res. Soc. Symp. Proc. 358, 883 (1995)
3. G. Liu and S. J. Fonash, Appl. Phys. Lett. 55, 660 (1989).
4. C. Hayzelden and J. L. Batstone, J. Appl. Phys. 73, 8279 (1993).
5. S.-W. Lee, T.-H. Ihn, and S.-K. Joo, Appl. Phys. Lett. 69, 380 (1996).
6. O. Schoenfeld, T. Hempel, X. Zhao, and Y. Aoyagi, Thin Solid Films 261, 236 (1995).
7. S. Y. Yoon, K. H. Kim, C. O. Kim, J. Y. Oh, and J. Jang, J. Appl. Phys. 82, 5865 (1997).
8. Z. Jin, G. A. Bhat, M. Yeung, H. S. Kwok, and M. Wong, J. Appl. Phys. 84, 194 (1998).
9. S. Y. Yoon, J. Y. Oh, C. O. Kim, and J. Jang, J. Appl. Phys. 84, 6463 (1998).
10. H. Kim, J. G. Couillard, and D. G. Ast, Appl. Phys. Lett. 72, 803 (1998).
11. K. N. Tu and J. W. Mayer, Thin Films-Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. W. Mayer (Wiley, New York, 1978), p. 359.
12. E. Maillard-Schaller, B. I. Boyanov, S. English, and R. J. Nemanich, J. Appl. Phys. 85, 3614 (1999).
13. C.-D. Lien, M.-A. Nicolet, and S. S. Lau, Phys. Status Solidi A 81, 123 (1984).
14. R. C. Cammarata, C. V. Thompson, and K. N. Tu, Appl. Phys. Lett. 51, 1108 (1987).