Local electrochemical oxidation/reduction: First step towards a new lithography?

Applied Physics Letters

Volumn 68, Issue 14, 1996, Pages 1999-2001

  Locquet, Jean Pierre ^a   Arrouy, Frédéric ^a   MäcHler, Erich ^a   Despont, Michel ^a   Bauer, Peter ^a   Williams, Erica J ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009215776     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115617     Document Type: Article

References (15)

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