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Applied Physics Letters

Volumn 72, Issue 21, 1998, Pages 2748-2750

Study of Ge bonding and distribution in plasma oxides of Si1-xGex alloys

(5) Seck, M a Devine, R A B b Hernandez, C b Campidelli, Y b Dupuy, J C c

a CNRS (France)

b ORANGE LABS (France)

c INSTITUT DES NANOTECHNOLOGIES DE LYON (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001042318 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.121078 Document Type: Article

Times cited : (22)

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