Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography

Semiconductor Science and Technology

Volumn 11, Issue 10, 1996, Pages 1450-1455

  Jiang, Zhong Tao ^a   Hong, Seungbum ^a   Kim, Eunah ^a   Bae, Byeong Soo ^a   No, Kwangsoo ^a   Hwangbo, Chang Kwon ^b   Lim, Sung Chul ^c   Woo, Sang Gyun ^c   Koh, Young Bum ^c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Inha University   (South Korea)

^c SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; NUMERICAL ANALYSIS; OPTICAL PROPERTIES; PHASE SHIFT; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES;

EXPOSURE WAVELENGTH; EXTINCTION COEFFICIENT; OPTICAL PROPERTY SIMULATION; SINGLE LAYER HALFTONE PHASESHIFTING MASKS;

MASKS;

EID: 0030260229     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/11/10/016     Document Type: Article

References (19)

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