Direct writing of active loads by focused ion beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2567-2569

  Wiemann, C ^a   Versen, M ^a   Wieck, A D ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000945866     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590211     Document Type: Article

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