Self-assembled Fe nanowires using organometallic chemical vapor deposition and CaF2 masks on stepped Si(111)

Applied Physics Letters

Volumn 78, Issue 6, 2001, Pages 829-831

  Lin, J L ^a   Petrovykh, D Y ^a   Kirakosian, A ^a   Rauscher, H ^a   Himpsel, F J ^a   Dowben, P A ^b  

^a University of Wisconsin ^*  (United States)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000851610     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1345830     Document Type: Article

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