Lifetime distribution of PL under pulsed excitation in hydrogenated amorphous silicon based films

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 574-577

  Ogihara, C ^a   Takemura, H ^a   Yoshida, H ^a   Morigaki, K ^b  

^a YAMAGUCHI UNIVERSITY   (Japan)

^b HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000850446     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00731-0     Document Type: Article

References (11)

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