메뉴 건너뛰기




Volumn 74, Issue 26, 1999, Pages 4049-4051

Nanooxidation of silicon with an atomic force microscope: A pulsed voltage technique

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000761280     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123257     Document Type: Article
Times cited : (81)

References (23)
  • 20
    • 85034123046 scopus 로고    scopus 로고
    • note
    • The parameters which govern the oxidation kinetic are the amplitude of the applied voltage and the tip velocity, for a given doping level and relative humidity.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.