New infrared absorption bands related to interstitial oxygen in silicon

Journal of Applied Physics

Volumn 84, Issue 5, 1998, Pages 2466-2470

  Hallberg, T ^a   Murin, L I ^b   Lindstrom J L ^a   Markevich, V P ^b  

^a LINKÖPING UNIVERSITY   (Sweden)

^b INSTITUTE OF SOLID STATE AND SEMICONDUCTOR PHYSICS   (Belarus)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000706252     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368407     Document Type: Article

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