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Volumn 266-269 A, Issue , 2000, Pages 603-607

Optimization of the as-deposited 1.54 μm photoluminescence intensity in a-SiOx : H〈Er〉

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Indexed keywords


EID: 0000659769     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00751-6     Document Type: Article
Times cited : (13)

References (17)
  • 11
    • 0032632535 scopus 로고    scopus 로고
    • S. Wagner, M. Hack, H.M. Branz, R. Schroop, I. Shimizu (Eds.), Mater. Res. Soc. Symp. Proc., MRS, Pittsburgh, PA
    • L.R. Tessler, A.C. Iñiguez, in: S. Wagner, M. Hack, H.M. Branz, R. Schroop, I. Shimizu (Eds.), Amorphous and Microcrystalline Silicon Technology - 1998, vol. 507, Mater. Res. Soc. Symp. Proc., MRS, Pittsburgh, PA, 1999, p. 279.
    • (1999) Amorphous and Microcrystalline Silicon Technology - 1998 , vol.507 , pp. 279
    • Tessler, L.R.1    Iñiguez, A.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.