Open volume defects (measured by positron annihilation spectroscopy) in thin film hydrogen-silsesquioxane spin-on-glass; correlation with dielectric constant

Journal of Applied Physics

Volumn 86, Issue 6, 1999, Pages 3104-3109

  Petkov, Mihail P ^a   Weber, Marc H ^a   Lynn, Kelvin G ^a   Rodbell, Kenneth P ^b   Cohen, Stephan A ^b  

^a WASHINGTON STATE UNIVERSITY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000604030     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371174     Document Type: Article

References (23)

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