Measuring and modeling optical diffraction from subwavelength features

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 18, Issue 3, 2001, Pages 565-572

  Wang, Xu ^a   Mason, Jeffrey ^b   Latta, Milton ^b   Strand, Timothy C ^b   Marx, David ^c   Psaltis, Demetri ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c Dynamics Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ION BEAMS; LIGHT POLARIZATION; LIGHT SCATTERING; PHOTOMULTIPLIERS;

SUBWAVELENGTH ANALYSIS;

ELECTROMAGNETIC WAVE DIFFRACTION;

EID: 0000599040     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.18.000565     Document Type: Article

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