ITO surface ball formation induced by atomic hydrogen in PECVD and HW-CVD tools

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 123-129

  Lan, Je Hsiung ^a   Kanicki, Jerzy ^a  

^a University of Michigan   (United States)

Author keywords

Atomic hydrogen; Indium tin oxide; PECVD; XRD

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DEGRADATION; ELECTRIC CONDUCTIVITY OF SOLIDS; HYDROGEN; LIGHT TRANSMISSION; OPACITY; OPTICAL FILMS; PLASMA APPLICATIONS; SURFACE STRUCTURE; SURFACE TREATMENT; X RAY DIFFRACTION ANALYSIS;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); INDIUM TIN OXIDE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SURFACE BALL FORMATION;

CONDUCTIVE FILMS;

EID: 0031189207     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00173-9     Document Type: Article

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