Effects of CeO2 incorporation on the performance of a Ta diffusion barrier for Al metallization

Journal of Applied Physics

Volumn 85, Issue 4, 1999, Pages 2170-2174

  Kim, Jaehwa ^a   Kwak, Joon Seop ^a   Yoon, Dong Soo ^a   Baik, Hong Koo ^a   Lee, Sung Man ^b  

^a Yonsei University   (South Korea)

^b Kangwon National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000567498     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369522     Document Type: Article

References (12)

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