Strong anisotropy in thin magnetic films deposited on obliquely sputtered Ta underlayers

Journal of Applied Physics

Volumn 88, Issue 9, 2000, Pages 5296-5299

  McMichael, R D ^a   Lee, C G ^b   Bonevich, J E ^a   Chen, P J ^a   Miller, W ^a   Egelhoff Jr , W F ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Changwon National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000372550     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1323436     Document Type: Article

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