Tunneling magnetoresistance effect of granular Co-Ta-O films sputtered under an oblique cathode arrangement

IEEE Transactions on Magnetics

Volumn 35, Issue 5 PART 1, 1999, Pages 2916-2918

  Tanaka, Kazato ^a   Yamauchi, Shinya ^b   Makino, Eiji ^a   Fujii, Toshitaka ^a   Inoue, Mitsutem ^a   Izaki, Masanobu ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

Co ta o granular films; Corrugated and columnar structures; Oblique sputtering; Tunneling magnetoresistance effect

Indexed keywords

CATHODES; COBALT; EVAPORATION; GRANULAR MATERIALS; MAGNETORESISTANCE; TANTALUM COMPOUNDS;

TUNNELING MAGNORESISTANCE;

MAGNETIC FILMS;

EID: 0033184436     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.801024     Document Type: Article

References (7)

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