Accuracy of Total Reflection X-Ray Fluorescence Spectrometry near the Detection Limit

Analytical Sciences

Volumn 14, Issue 2, 1998, Pages 275-280

  Mori, Yoshihiro ^a   Kubota, Kazuhiko ^a   Shimanoe, Kengo ^a,b   Sakon, Tadashi ^a  

^a NIPPON STEEL CORPORATION   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

Accuracy; Atomic absorption spectrophotometry; Contamination; Silicon wafer; Total reflection x ray fluorescence spectrometry; Transition metal

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMS; CONTAMINATION; ELECTROMAGNETIC WAVE REFLECTION; FLUORESCENCE; FLUORESCENCE SPECTROSCOPY; METAL ANALYSIS; SILICON WAFERS; TRANSITION METALS;

ACCURACY; ATOMIC ABSORPTION SPECTROPHOTOMETRY; CONCENTRATION REGION; CONTROLLED CONDITIONS; LOW CONCENTRATIONS; METAL CONTAMINANTS; SUBSTRATE SURFACE; TOTAL REFLECTION X-RAY FLUORESCENCE SPECTROMETRIES;

X RAYS;

EID: 0032379217     PISSN: 09106340     EISSN: None     Source Type: Journal    
DOI: 10.2116/analsci.14.275     Document Type: Article

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