Electron beam-enhanced oxynitridation of Si(100) by NO adsorption

Surface and Interface Analysis

Volumn 29, Issue 3, 2000, Pages 188-193

  Bater, C ^a   Sanders, M ^a   Craig, J H ^a  

^a UNIVERSITY OF TEXAS AT EL PASO   (United States)

Author keywords

ESD; HREELS; NO; Oxynitride; Si(100); XPS

Indexed keywords

EID: 0000157004     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(200003)29:3<188::AID-SIA681>3.0.CO;2-L     Document Type: Article

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