Area scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 6700-6702

  Boeve, H ^a   Van De Veerdonk, R J M ^b,c   Dutta, B ^a   De Boeck, J ^a   Moodera, J S ^c   Borghs, G ^a  

^a IMEC   (Belgium)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000070131     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367839     Document Type: Article

References (13)

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