Spin tunneling magnetoresistance in NiFe/Al2O3/Co junctions with reduced dimensions formed using photolithography

Journal of Magnetism and Magnetic Materials

Volumn 166, Issue 1-2, 1997, Pages 71-74

  Kumagai, S ^a   Yaoi, T ^b   Miyazaki, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b SONY CORPORATION   (Japan)

Author keywords

Exchange coupling; Metal insulator junction; Photolithography; Spin tunneling magnetoresistance

Indexed keywords

ALUMINA; BOND STRENGTH (CHEMICAL); COBALT; ELECTRON TUNNELING; ION EXCHANGE; MAGNETIC COUPLINGS; MAGNETIC MATERIALS; MAGNETORESISTANCE; NICKEL ALLOYS; PHOTOLITHOGRAPHY;

EXCHANGE COUPLING; METAL INSULATOR JUNCTION; NEGATIVE INTERLAYER EXCHANGE COUPLING; NICKEL IRON ALLOY; SPIN TUNNELING MAGNETORESISTANCE;

MULTILAYERS;

EID: 0031077525     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(96)00441-6     Document Type: Article

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