Magnetic tunnel junctions fabricated at tenth-micron dimensions by electron beam lithography

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 249-252

  Rishton, S A ^a   Lu, Y ^b   Altman, R A ^a   Marley, A C ^c   Bian, X P ^c   Jahnes, C ^a   Viswanathan, R ^a   Xiao, G ^b   Gallagher, W J ^a   Parkin, S S P ^c  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b BROWN UNIVERSITY   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; ELECTRODES; FABRICATION; MAGNETIC THIN FILM DEVICES; MAGNETORESISTANCE; NANOTECHNOLOGY; SPUTTER DEPOSITION; TUNNEL JUNCTIONS;

ION MILLING; MAGNETIC TUNNEL JUNCTION; PERMALLOY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031074307     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00107-4     Document Type: Article

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