Scatterometry for CD measurements of etched structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 720-728

  Raymond, Christopher J ^a   Naqvi, S Sohail H ^a   McNeil, John R ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSIONS; MICROLITHOGRAPHY; POLYSILICON;

ALGORITHMS; CHARACTERIZATION; DISTANCE MEASUREMENT; ETCHING; MICROELECTRONICS; MICROMETERS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

LIGHT SCATTERING;

EID: 0029748837     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)