Optimization of plasma etch processes using evolutionary search methods with in situ diagnostics

Plasma Sources Science and Technology

Volumn 13, Issue 4, 2004, Pages 612-622

  Al Kuzee, J ^a   Matsuura, T ^a,d   Goodyear, A ^a   Nolle, L ^b   Hopgood, A A ^b   Picton, P D ^c   Braithwaite, N St J ^a  

^a OPEN UNIVERSITY   (United Kingdom)

^b NOTTINGHAM TRENT UNIVERSITY   (United Kingdom)

^c UNIVERSITY OF NORTHAMPTON   (United Kingdom)

^d UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DISSOCIATION; ELECTROMAGNETIC WAVE EMISSION; OPTIMIZATION; PLASMAS; PRESSURE EFFECTS; SPECTRUM ANALYSIS;

NITROGEN PLASMAS; OPTICAL EMISSION SPECTRUM (OES); PLASMA PROCESSING; QUADRUPOLE MASS SPECTRUM (QMS);

PLASMA ETCHING;

EID: 9944251471     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/4/010     Document Type: Article

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