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Volumn 125, Issue 11 SPEC. ISS., 2004, Pages 1671-1676
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New fluoropolymer materials
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Author keywords
157 nm; 193 nm; Dielectrics; Immersion lithography; Lithography; Microfluidics; Nanotechnology; Photoresists; Soft lithography; Supercritical fluids
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Indexed keywords
FLUORINE DERIVATIVE;
LITHIUM;
POLYMER;
CONFERENCE PAPER;
FUTUROLOGY;
IMMERSION;
LITHOGRAPHY;
MOLECULAR DYNAMICS;
MOLECULAR INTERACTION;
MOLECULAR MECHANICS;
PHOTOLITHOGRAPHY;
POLYMERIZATION;
SYNTHESIS;
TECHNIQUE;
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EID: 9944232085
PISSN: 00221139
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jfluchem.2004.09.029 Document Type: Conference Paper |
Times cited : (11)
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References (18)
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