New fluoropolymer materials

Journal of Fluorine Chemistry

Volumn 125, Issue 11 SPEC. ISS., 2004, Pages 1671-1676

  Wood, Colin D ^a   Michel, Udo ^a   Rolland, Jason P ^a   DeSimone, Joseph M ^a,b  

^a University of North Carolina at Chapel Hill   (United States)

^b North Carolina State University   (United States)

Author keywords

157 nm; 193 nm; Dielectrics; Immersion lithography; Lithography; Microfluidics; Nanotechnology; Photoresists; Soft lithography; Supercritical fluids

Indexed keywords

FLUORINE DERIVATIVE; LITHIUM; POLYMER;

CONFERENCE PAPER; FUTUROLOGY; IMMERSION; LITHOGRAPHY; MOLECULAR DYNAMICS; MOLECULAR INTERACTION; MOLECULAR MECHANICS; PHOTOLITHOGRAPHY; POLYMERIZATION; SYNTHESIS; TECHNIQUE;

EID: 9944232085     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jfluchem.2004.09.029     Document Type: Conference Paper

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