메뉴 건너뛰기




Volumn 125, Issue 11 SPEC. ISS., 2004, Pages 1671-1676

New fluoropolymer materials

Author keywords

157 nm; 193 nm; Dielectrics; Immersion lithography; Lithography; Microfluidics; Nanotechnology; Photoresists; Soft lithography; Supercritical fluids

Indexed keywords

FLUORINE DERIVATIVE; LITHIUM; POLYMER;

EID: 9944232085     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jfluchem.2004.09.029     Document Type: Conference Paper
Times cited : (11)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.