Effect of the substrate temperature on the properties of RE-Fe-B thin film magnets

Journal of Applied Physics

Volumn 96, Issue 9, 2004, Pages 5063-5068

  Castaldi, L ^a,b   Gibbs, M R J ^a   Davies, H A ^a  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CRYSTALLOGRAPHY; IRON; MAGNETIC ANISOTROPY; MAGNETIC PROPERTIES; MAGNETRON SPUTTERING; OXIDATION; RHENIUM ALLOYS; SILICON; SUBSTRATES; THIN FILMS;

ATOMIC RATIO; CRYSTALLINE PHASE; HARD MAGNETIC PROPERTIES; PERPENDICULAR ANISOTROPY;

MAGNETS;

EID: 9744281901     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1775044     Document Type: Article

References (35)

1. R. Coehoorn, D. B. De Mooij, and C. De Waard, J. Magn. Magn. Mater. 80, 101 (1989).
2. H. A. Davies, J. Magn. Magn. Mater. 157/158, 11 (1996).
3. Tsung-Shune Chin, J. Magn. Magn. Mater. 209, 75 (2000).
4. F. J. Cadieu, T. D. Cheung, L. Wickramasekara, and N. Kamprath, IEEE Trans. Magn. 22, 752 (1986).
5. B. A. Kapitanov, N. V. Kornilov, Ya. L. Linetsky, and V. Yu. Tsvetkov, J. Magn. Magn. Mater. 127, 289 (1993).
6. S. Parhofer, O. Gieres, J. Wecker, and L. Schultz, J. Magn. Magn. Mater. 163, 32 (1996).
7. S. Parhofer, C. Kuhrt, J. Wecker, G. Gieres, and L. Schultz, J. Appl. Phys. 83, 2735 (1998).
8. W. Tang, Z. Q. Jin, J. R. Zhang, G. Gu, J. M. LI, and Y. W. Du, J. Magn. Magn. Mater. 185, 241 (1998).
9. J. L. Tsai and T. S. Chin, Proc. XV Intl. Workshop on Rare Earth Magnets and their Applications, edited by L. Schultz and K.-H. Muller (Werkstoff informations gesellschaft, Frankfurt, 1998), pp. 1067-1075.
10. S. N. Piramanayagam, M. Matsumoto, and A. Morisako, J. Appl. Phys. 85, 5898 (1999).
11. T. Araki, T. Nakanishi, and T. Umemura, J. Appl. Phys. 85, 4877 (1999).
12. S. N. Piramanayagam, M. Matsumoto, and A. Morisako, J. Magn. Magn. Mater. 212, L12 (2000).
13. H. Jiang and M. J. O'Shea, IEEE Trans. Magn. 37, 2579 (2001).
14. L. Castaldi, H. A. Davies, and M. R. J. Gibbs, J. Magn. Magn. Mater. 242-245, 1284 (2002).
15. L. Castaldi, M. R. J. Gibbs, and H. A. Davies, J. Appl. Phys. 93, 9165 (2003).
16. Y. B. Kim, M. J. Kim, J. H. Yang, K. S. Ryu, Y. Li, and T. K. Kim, J. Magn. Magn. Mater. 234, 489 (2001).
17. J. H. Yang, M. J. Kim, S. H. Cho, H. T. Kim, Y. B. Kim, G. A. Kapustin, and K. H. Lee, J. Magn. Magn. Mater. 248, 374 (2000).
18. G. E. Carr, H. A. Davies, and R. A. Buckley, Mater. Sci. Eng. 99, 147 (1988).
19. Y. Yamamura and M. Ishida, J. Vac. Sci. Technol. A 13, 101 (1995).
20. Ludmila Eckertovà, Physics of Thin Films (Plenum, New York, 1986).
21. C. H. Chen, M. S. Walmer, and M. H. Walmer, J. Appl. Phys. 85, 5669 (1999).
22. O. Madelung, Semiconductors - Basic Data, 2nd ed. (Springer, Berlin, 1996).
23. L. Castaldi, H. A. Davies, and M. R. J. Gibbs, Proc. XVII Intl. Workshop on Rare Earth Magnets and their Applications, edited by G C Hadji-panayis and M. J. Bonder (Rinton, Princeton, 2002), pp 461-470.
24. R. D. Thompson, B. Y. Tsaur, and K. N. Tu, Appl. Phys. Lett. 38, 535 (1981).
25. A. Travlos, N. Salamouras, and N. Boukos, J. Phys. Chem. Solids 64, 87 (2003).
26. L. Castaldi, H. A. Davies, and M. R. J. Gibbs, J. Appl. Phys.
27. R. A. Powell, S. Rossnagel, Thin Films (Academic, San Diego, 1999).
28. R. Skomski and J. M. D. Coey, Permanent Magnetism (Institute of Physics, Bristol, 1999).
29. F. J. Cadieu, in Physics of Thin Films, Permanent Magnet Thin Films, edited by M. H. Francombe and J. L. Vossen (Academic, San Diego, 1992).
30. R. Skomski, J. P. Liu, and D. J. Sellmyer, J. Appl. Phys. 87, 6334 (2000).
31. G. N. Kakazei, N. A. Lesnik, A. I. Mitsek, and V. N. Pushkar, Sov. Phys. Solid State 34, 305 (1992).
32. C. D. Mee and E. D. Daniel, Magnetic Recording Technology (McGraw-Hill, New York, 1996), p. 9.9.
33. H. Kronmüller, K. D. Durst, and M. Sagawa, J. Magn. Magn. Mater. 74, 291 (1988).
34. M. A. Al-Khafaji, I. Ahmad, W. M. Rainforth, H. A. Davies, and R. A. Buckley, Philos. Mag. A 81, 11 (2001).
35. D. W. Hoffman and J. A. Thornton, J. Vac. Sci. Technol. 20, 355 (1982).