Bias-magnetron sputtering of tungsten carbide coatings on steel;Bias-Magnetron Sputtern von Wolframkarbid-Schichten auf Stahl

Materialwissenschaft und Werkstofftechnik

Volumn 35, Issue 10-11, 2004, Pages 916-923

  Gubisch, M ^a   Spiess L ^b   Romanus, H ^b   Schawohl, J ^b   Knedlik, Ch ^b  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b NONE

Author keywords

Bias voltage; Hardness; Magnetron sputtering; Tungsten carbide

Indexed keywords

BIAS VOLTAGE; PREFERRED ORIENTATIONS; REACTIVE MAGNETRON SPUTTERING; TUNGESTEN CARBIDE;

ATOMIC FORCE MICROSCOPY; COATINGS; ELECTRIC POTENTIAL; ENERGY DISPERSIVE SPECTROSCOPY; HARDNESS; MAGNETRON SPUTTERING; MORPHOLOGY; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; STEEL; THICKNESS CONTROL; X RAY DIFFRACTION ANALYSIS;

TUNGSTEN COMPOUNDS;

EID: 9744281224     PISSN: 09335137     EISSN: None     Source Type: Journal    
DOI: 10.1002/mawe.200400812     Document Type: Article

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