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Volumn 75, Issue 10 I, 2004, Pages 3256-3263

Polarized neutron reflectometry of a patterned magnetic film with a 3He analyzer and a position-sensitive detector

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC FORCE MICROSCOPY; NEUTRON REFLECTROMETRY; PATTERNED MAGNETIC FILM; POSITIVE-SENSITIVE DETECTORS;

EID: 9744256271     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1791312     Document Type: Article
Times cited : (24)

References (37)
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    • Sinha, S.K.1
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    • J. A. Borchers et al., Physica B 283, 162 (2000); J. A. Borchers et al., Phys. Rev. Lett. 82, 2796 (1999).
    • (1999) Phys. Rev. Lett. , vol.82 , pp. 2796
    • Borchers, J.A.1
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    • W. C. Chen et al., Physica B 335, 196 (2003).
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    • Chen, W.C.1
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    • Oxford University Press, New York
    • W. G. Williams, Polarized Neutrons (Oxford University Press, New York, 1988), p. 135.
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    • Williams, W.G.1
  • 27
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    • note
    • GE Lighting Component Sales, Cleveland, OH 44117. Certain trade names and company products are mentioned in the text or identified in an illustration in order to adequately specify the experimental procedure and equipment used. In no case does such identification imply recommendation or endorsement by the National Institute of Standards and Technology, nor does it imply that the products are necessarily the best available for the purpose.
  • 28
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    • (1998) J. Appl. Crystallogr. , vol.31 , pp. 430
    • Glinka, C.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.