Stability of a circular epitaxial island

Physica D: Nonlinear Phenomena

Volumn 198, Issue 3-4, 2004, Pages 231-247

  Li, Bo ^a   Rätz, Andreas ^b   Voigt, Axel ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b CENTER OF ADVANCED EUROPEAN STUDIES AND RESEARCH CAESAR   (Germany)

Author keywords

Attachment detachment kinetics; Circular islands; Epitaxial growth; Island dynamics; Line tension; Morphological stability; Surface diffusion

Indexed keywords

BOUNDARY CONDITIONS; CRYSTAL GROWTH; DIFFUSION; EVAPORATION; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; MORPHOLOGY; VELOCITY MEASUREMENT;

ATTACHEMENT-DETACHEMENT KINETICS; CIRCULAR ISLANDS; ISLAND DYNAMICS; LINE TENSION; MORPHOLOGICAL STABILITY; SURFACE DIFFUSION;

EPITAXIAL GROWTH;

EID: 9644290932     PISSN: 01672789     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physd.2004.08.029     Document Type: Article

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