Growth of nanocrystalline diamond films in CCl4/H2 ambient

Thin Solid Films

Volumn 473, Issue 1, 2005, Pages 24-30

  Wu, Jih Jen ^a   Ku, Chen Hao ^a   Wong, Te Chi ^a   Wu, Chien Ting ^b   Chen, Kuei Hsien ^b   Chen, Li Chyong ^c  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Chemical vapor deposition; Chlorine; Diamond; Nanostructures

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CHLORINE; GRAIN GROWTH; NANOSTRUCTURED MATERIALS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

GRAIN NUCLEATION; MICRONS; NANOSTRUCTURES; SUBSTRATE TEMPERATURE;

DIAMOND FILMS;

EID: 9644273988     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.152     Document Type: Article

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