Local structural change of amorphous Ge-Sb-Te thin film on annealing

Journal of Non-Crystalline Solids

Volumn 345-346, Issue , 2004, Pages 112-115

  Naito, Muneyuki ^a   Ishimaru, Manabu ^a   Hirotsu, Yoshihiko ^a   Takashima, Masaki ^b  

^a OSAKA UNIVERSITY   (Japan)

^b Ctr for Analyt Chem/Science Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ANTIMONY; CRYSTAL ATOMIC STRUCTURE; ELECTRON DIFFRACTION; GERMANIUM; HIGH RESOLUTION ELECTRON MICROSCOPY; MOLECULAR STRUCTURE; OPTICAL RECORDING; PROTECTIVE COATINGS; TELLURIUM; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

MECHANICAL POLISHING; NANO-BEAM ELECTRON DIFFRACTION; PHASE CHANGE OPTICAL DISKS;

AMORPHOUS FILMS;

EID: 9544234493     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.08.005     Document Type: Conference Paper

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