In flight treatment of metallurgical silicon powder by RF thermal plasma: Elaboration of hydrogenated silicon deposit on a substrate

Thin Solid Films

Volumn 403-404, Issue , 2002, Pages 112-115

  Benmansour, M ^a   Francke, E ^a   Morvan, D ^a   Amouroux, J ^a   Ballutaud, D ^b  

^a SORBONNE UNIVERSITÉ   (France)

^b CNRS   (France)

Author keywords

Hydrogenation; Silicon deposit; Thermal plasma

Indexed keywords

APPROXIMATION THEORY; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; HYDROGENATION; OPTIMIZATION; PLASMA THEORY; POWDERS; PURIFICATION;

THERMAL PLASMAS;

SILICON;

EID: 0036467642     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01564-4     Document Type: Conference Paper

References (9)