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Volumn 5455, Issue , 2004, Pages 116-127

Designing manufacturable MEMS in CMOS compatible processes - Methodology and case studies

Author keywords

CAD; CMOS compatible; Design for Manufacturing; EDA; MEMS; Micromachining; Process Design Kits

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; COSTS; FABRICATION; MICROMACHINING; PERFORMANCE; PROBABILITY; PRODUCT DESIGN;

EID: 8844239321     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544971     Document Type: Conference Paper
Times cited : (17)

References (21)
  • 12
    • 0035763547 scopus 로고    scopus 로고
    • Engineering in- and out-of-plane stress in PECVD silicon nitride for CMOS-compatible micromachining
    • SPIE-4557, San Francisco (USA). Oct.
    • R Davies. M McNie, K Brunson & D Combes, "Engineering in- and out-of-plane stress in PECVD silicon nitride for CMOS-compatible micromachining", SPIE-4557, Int. Symposium on 'Micromachining and Microfabrication', San Francisco (USA). Oct. 2001, pp.320-328
    • (2001) Int. Symposium on 'Micromachining and Microfabrication' , pp. 320-328
    • Davies, R.1    McNie, M.2    Brunson, K.3    Combes, D.4
  • 13
    • 2942685664 scopus 로고    scopus 로고
    • Control of stress in a metal-nitride-metal sandwich for CMOS-compatible surface micromachining
    • Paper A-8.5, Boston (USA), Dec
    • R R Davies, D J Combes, M E McNie & K M Brunson, "Control of Stress in a Metal-Nitride-Metal Sandwich for CMOS-Compatible Surface Micromachining", Paper A-8.5, Proc. MRS Fall Meeting, Boston (USA), Dec 2003
    • (2003) Proc. MRS Fall Meeting
    • Davies, R.R.1    Combes, D.J.2    McNie, M.E.3    Brunson, K.M.4
  • 15
    • 8844250477 scopus 로고    scopus 로고
    • Metal-nitride surface micromachining
    • Revision 1.1, published QinetiQ Ltd and Coventor Sarl
    • INTEGRAM Metal-Nitride Prototyping Kit, Design Handbook, Metal-nitride surface micromachining. Revision 1.1, published 2003 by QinetiQ Ltd and Coventor Sarl
    • (2003) INTEGRAM Metal-nitride Prototyping Kit, Design Handbook
  • 16
    • 0037998356 scopus 로고    scopus 로고
    • CMOS compatibility of high aspect ratio micromachining (HARM) in bonded silicon-on-insulator (BSOI)
    • SPIE-3511, San Jose (USA), Sept.
    • M E McNie & D O King, "CMOS compatibility of High Aspect Ratio Micromachining (HARM) in bonded Silicon-on-Insulator (BSOI)", SPIE-3511, Int. Symposium on 'Micromachining and Microfabrication', San Jose (USA), Sept. 1998, pp.277-287
    • (1998) Int. Symposium on 'Micromachining and Microfabrication' , pp. 277-287
    • McNie, M.E.1    King, D.O.2
  • 19
    • 8844251208 scopus 로고    scopus 로고
    • SOI micromachining
    • Revision 2.0b, published by QinetiQ Ltd and Coventor Sarl
    • INTEGRAM Deep Prototyping Kit, Design Handbook, SOI Micromachining, Revision 2.0b, published by QinetiQ Ltd and Coventor Sarl
    • INTEGRAM Deep Prototyping Kit, Design Handbook
  • 20
    • 8844270613 scopus 로고    scopus 로고
    • US patent 6,542,829, assigned to Coventor Inc.
    • US patent 6,542,829, assigned to Coventor Inc.
  • 21
    • 0034270152 scopus 로고    scopus 로고
    • Electronically probed measurements of MEMS geometries
    • Sept.
    • Gupta Raj K., "Electronically Probed Measurements of MEMS Geometries", J. MEMS., Vol. 9, No. 3, Sept. 2000, p.380
    • (2000) J. MEMS , vol.9 , Issue.3 , pp. 380
    • Gupta Raj, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.