Ultra narrow band pass filters produced by plasma ion assisted deposition

Optics InfoBase Conference Papers

Volumn , Issue , 2001, Pages

  Hagedorn, Harro ^a   Lotz, Armin ^a   Pecher, Peter ^a   Treichel, Oliver ^a  

^a Leybold Optics GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAM ASSISTED DEPOSITION; OPTICAL FIBER COMMUNICATION; OPTICAL FIBERS;

NARROW BANDPASS FILTERS; PLASMA ION ASSISTED DEPOSITION; TEMPERATURE SHIFT; ULTRA NARROW BAND;

BANDPASS FILTERS;

EID: 8744262250     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. th annual technical conference, SVC, 320-326, (1997)
2. A. Zöller, R. Götzelmann, H. Hagedorn, W. Klug, K. Matl, “Plasma ion assisted deposition: a powerful technology for the production of optical coatings” in Optical Thin Films V: New Developments, Randolph L. Hall, ed., SPIE Vol. 3133-23, (1997)
3. A. Zöller, R.Götzelmann, K. Matl, and D. Cushing, “Temperature-stable bandpass filters deposited with plasma ion-assisted deposition”, Applied Optics, Vol 35, No. 28, 5609-5612, (1996)
4. A. Macleod, “Challenges in the Design and production of narrow band filters for optical fiber telecommunications”, in Optical and Infrared Thin Films, M. Fulton, ed., SPIE Vol. 4094-46, (2000)
5. H. Takashashi, “Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition”, Appl. Opt. Vol.34 No. 4, 667-675, (1995)