Plasma ion assisted deposition: An innovative technology for high quality optical coatings

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 1997, Pages 320-324

  Goetzelmann, R ^a   Zoeller, A ^a   Klug, W ^a   Matl, K ^a   Hagedorn, H ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; DEPOSITION; EVAPORATION; ION BEAMS; ION BOMBARDMENT; LIGHT INTERFERENCE; PLASMA APPLICATIONS;

CONDUCTIVE COATINGS; OPTICAL INTERFERENCE COATINGS; PLASMA ASSISTED EVAPORATION; PLASMA ION ASSISTED DEPOSITION;

OPTICAL COATINGS;

EID: 0031348671     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)