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Volumn 389-393, Issue , 2002, Pages 459-462

Investigation of the relationship between defects and electrical properties of 3C-SiC epilayers

Author keywords

3C SiC; Defects; Macrosteps; Schottky barrier junctions; Stacking faults; Twin band

Indexed keywords

DEFECTS; ELECTRIC CURRENTS; EPILAYERS; SCHOTTKY BARRIER DIODES; STACKING FAULTS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 8744257748     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028hnnwscientific.net/MSF.389-393.459     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 4
    • 84953205386 scopus 로고    scopus 로고
    • Musashino, Akishima, Tokyo 196-8510, Japan
    • HOYA Corporation: 3-3-1, Musashino, Akishima, Tokyo 196-8510, Japan.
  • 5
    • 84953288089 scopus 로고    scopus 로고
    • 3C-SiC(100) Homocpitaxial Growth by Chemical Vapor Deposition and Schottky Barrier Junction Characteristics
    • Y. Ishida, M. Kushibe, T. Takahashi, H. Okumura and S. Yoshida: "3C-SiC(100) Homocpitaxial Growth by Chemical Vapor Deposition and Schottky Barrier Junction Characteristics ", present Proceedings.
    • Present Proceedings
    • Ishida, Y.1    Kushibe, M.2    Takahashi, T.3    Okumura, H.4    Yoshida, S.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.